Clean Room & Nanofabrication Facility

An Open User Facility at Boston College

Open to both Boston College and External Users, this laboratory is home to over 30 high-end micro and nanoscale instrumentation systems worth several million dollars.

Comprised of 1,500 square feet of Class 1,000 and Class 10,000 cleanroom spaces, the lab enables highly sensitive materials and devices to be fabricated free from contaminants. In addition, there is over 2,000 square feet of service and support space.The lab is supported by an air handling unit that completely cleans and renews all the air in the facility every 45 seconds.

  • 1500 sqft of class 1,000 and 10,000 clean room space
  • 2,000sqft of service and support area space
  • 10,000 CFM air handling unit with approximately 75 air changes per hour
  • Room temperature between 65-70°F
  • Relative humidity of 50-60%
  • 18.2 MegOhm deionized water
  • House nitrogen (N2) from liquid nitrogen boil off, 35-45 psi
  • Compressed Dry Air (CDA) delivery pressure 90-100 psi
  • 30+ Capital equipment systems
  • Safety eyewash and safety shower inside and outside of cleanroom
  • 3 exhaust hoods for chemical work.
  • Gowning is required before entering the cleanroom to protect the environment and samples in process. Particulate-free bouffant caps coveralls, shoe covers, gloves, and safety glasses are provided.
  • Face shields, chemical resistant aprons, protective sleeves, and heavy chemical resistant gloves are provided for chemical work.
  • All high voltage equipment has at least one EMO for emergency shut down should problems arise
  • There are no highly toxic gases.

Every user receives training from our staff. The staff is there to assist users in troubleshooting and offer support when necessary.

  • State of the art facility and equipment
  • Perfect for small start-up companies and colleges
  • Easy set-up for new users
  • Cost effective/affordable rates
  • One-on-one training

Laboratory


Equipment and Rates

GeneralInternal Rates
(Boston College)
External Academic Rates
(non profit)
External Commercial
Rates
Cleanroom Use$32/hr
$32/hr
$60/hr
Remote Staff Assistance$100/hr$100/hr$100/hr

EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial
Rates
Scanning Electron Microscope
$44/hr

$44/hr

$105/hr

EDX (on SEM)included in
SEM rate

included in
SEM rate

included in
SEM rate

Focused Ion Beam System
$45/hr

$55/hr

$115/hr

Nanomanipulation and Electrical Probing
Micromanipulator
included in
FIB rate
included in
FIB rate
included in
FIB rate

EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial
Rates
Mask Aligner--

--

--

E-Beam Writer (on SEM)$44/hr

$44/hour

$105/hr

Resist Spinner Fume Hood

FWS-196-SS

--

--

--

Resist Spinner (2)

Cee 100

------
Resist Spinner--

--

--

Hot Plates (2)--------
Photoresist Stabilization SystemPL-16-100 UV------
Thermal Scanning Probe Lithography (t-SPL) system

Nanofrazor Scholar

------
Direct WriteMaskless Aligner

µѳ

------

*If theHeidelberg Nanofrazor Scholar was used for data collection that was later used in any publications, posters or presentations etc., please make sure to acknowledge the support from the National Science Foundation by citing the funding grant with the following statement: “The research reported in this [publication/talk/poster] was supported by the NSF MRI Program under the award number 1S10OD026910-01A1.”2117711";Principal Investigator: Kenneth, Burch

EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial
Rates
Sputter Deposition System$40/hour$40/hour$95/hr
Benchtop Sputter Deposition$10/run$10/run$25/run
Atomic Layer DepositionUltratech$15/hr$15/hr$50/hr
E-Beam Deposition System$35/run$40/run$75/run
Thermal Evaporator$10/hr$10/hr$45/hr
Sputter Deposition System$35/run$35/run$75/run
PE-CVD$40/run$40/run$95/run
E-Beam/Thermal Evaporator$35/hr$40/hr$75/hr
Electroplating System------
Atomic Layer
Deposition System
$15/hr$15/hr$50/hr
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
Optical Microscope
(High Power)

------
Optical Microscope
(Low Power)
------
Reflectometer------
Surface Profilometer------
Spectroscopic Ellipsometer------
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
ICP RIE$40/hr$40/hr$95/hr
Acid Etching Fume HoodFWS-196-4910------
UV-Ozone StripperUV-1------
Microwave Plasma Etch------
XeF2 Etch SystemX-SYS-
EXP Xetch
$15/hr$20/hr$50/hr
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
Solvent Cleaning Fume HoodFWS-196-SS------
Critical Point Dryer$8/run$15/run$25/run
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
Atmospheric FurnaceLindberg/Blue M 3-Zone Tube Furnace STF55666C$15/hr$20/hr$50/hr
Oven, general purpose (2)--------
Vacuum Oven (2)--------
Rapid Thermal Processor
$5/run$10/run$20/run
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
Bead BlasterEconoline Abrasive Blasting Cabinet$15/hr$15/hr$40/hr
Dicing Saw$16/hr*$20/hr*$65/hr*
Diamond Wheel Saw------
Wire Bonder$10/hr$15/hr$35/hr
EquipmentVendor
& Model
Internal RatesExternal Academic RatesExternal Commercial Rates
RF LCR Meter------
Probe/Test Station------
Four Point Probe StationMHMP/RMS-AR------


Frequently Asked Questions

Examples of Work Being Done in the Facility

Suppression of crosstalk in multielectrodearrays with local shielding, J.R. Naughton, J.A. Varela, T.J. Connolly, S. Shepard, T.E. Dodge, K.Kempa,M.J. Burns, J.P. Christianson, and M. J. Naughton, Frontiers in Nanotechnology.DOI:10.3389/fnano.2022.84337.

Wireless communication system via nanoscale plasmonic antennas, J. Merlo, N. Nesbit, Yitzi Calm, A. Rose, L. D’Imperio, C. Yang, J. Naughton, K. Kempa, M. J. Naughton, Scientific Reports 6.31710 DOI: 10.1038/srep 31710 (2016).

Droplet-Tn-Seq combines microfluidics with Tn-Seq identifying complex single-cell phenotypes, D. Thibault, S. Wood, P. Jensen, T. van Opijnen, bioRxiv, DOI: 10.1101/391045 (2018).

Hydrogen bonding steers the product selectivity of electro-catalytic CO Reduction, J. Li, X. Li, C. Gunathunge, M. Waegele, PNAS, DOI: 10.1073/pnas.1900761116 (2019).

Nanocoax-based electrochemical sensor, B. Rizal, M. Archibald, T. Connolly, S. Shepard, M.J. Burns, T.C Chiles, M.J. Naughton, Analytical Chemistry, DOI: 10.1021/ac402411x (2013).


All-solution-processed micro/nanowires with electroplatewelding as transparent conducting electrodes, C. Yang, J. Merlo, L. D’Imperio, A. Rose, Y. Calm, B. Han, J. Gao, G. Zhou, M. Burns, K. Kempa, M.J. Naughton, Physica Status Solidi-Rapid Research Letter. DOI: 10.1002/pssr.201900010 (2019).

Arrays of electrically-addressable, optically-transmitting 3Dnanostructures on free standing, flexible polymer films, L. D’Imperio, A. McCrossan, J. Naughton, J. Merlo, Y. Calm, M. Burns, M.J. Naughton, Flexible Printed Electronics, DOI: 10.1088/2058-8585/aac8fc (2018).

Label-free capture of breast cancer cells spiked in buffy coatsusing carbon nanotube antibody microarrays, Farhad Khosravi, et al, Nanotechnology, DOI: 0.1088/0957-4484/27/13/13LT02 (2016).


Cuddalorepatta, G. K.,van Rees, W. M.,Li, H., Pantuso, D.,Mahadevan L.M. & Vlassak, J.J.," Poisson’s ratio and residual strain of freestanding ultra-thin films", Journal of the Mechanics and Physics of Solids.

Cuddalorepatta, G. K.,Li, H., Pantuso, D., & Vlassak, J.J. "Measurement of the stress-strain behavior of freestanding ultra-thin films",Materialia,Vol.9,100502,2020..

Cuddalorepatta, G. K., Sim, G., Li, H., Pantuso, D., & Vlassak, J.J. "Residual stress–driven test technique for freestanding ultrathin films: Elastic behavior and residual strain"Journal of Materials Research,34(20), 3474-3482, 2019.

Nanofabrication & Cleanroom Facility
Chris Gunderson
Boston College
245 Beacon St.
Room #005 C
Chestnut Hill, MA 02467

617 552 0049
gunderch@bc.edu